Single Chamber Cleaning Tool (IZM-137) - PR1094599-3460-P

1x Single Chamber Cleaning Tool This specification describes the components and functions of a wet chemical cleaning system for semiconductor manufacturing. The system includes various media supply units, spray and rinse modules, and ionisation units for precise control and monitoring of process parameters. The system supports the cleaning of photomasks, film frame-mounted wafer substrates, and round wafers with diameters of 200 mm and 300 mm. These cleaning processes use Piranha and SC1 chemical solutions and are supplemented by ultrasonic agitation or brush-assisted cleaning to ensure thorough removal of organic residues, particles, and surface contaminants. The goal is to remove particles larger than 250 nm to support i-line lithography applications. Optional features: -Extreme deformation and deflection in the range of 1500 to 2500 µm -Improved removal of particles and residues through direct surface contact using a vertical rotary brush system -Motion-controlled vertical brush head -Chemically resistant brush material, suitable for aggressive media -Media used: DI water, SC1 (NH₄OH, H₂O₂), piranha (H₂O₂ / H₂SO₄), not temperature-controlled -Flow and pressure adjustable and monitorable: electronic display with programmable alarm limits -Precisely guided movement for uniform cleaning performance across the entire substrate surface -Dosing arm: Programmable movement (control of start/end point, scanning speed, rotational speed, brush height, brush pressure with force feedback) -Programmable brush self-cleaning cycles after each programme and during periods of inactivity (DI water rinsing to prevent media crystallisation) -Safety features: Programmable alarm limits with software lock for process control -Storage of CO₂ gas cylinders (2-6 kg, suitable for internal chemical supply/tool storage) -Function: Controlled CO₂ injection for -Conductivity range: 5-15 µS, stable to ±20 % -Filtration: 0.003 µm CO₂ gas filter -Software-controlled alarm limits and settings -Brush-assisted DI water, SC1 or Piranha cleaning on the front with DI water cleaning on the front and back, N₂ assisted spin drying

Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Vergeben am: 11.05.2026

BKS award notice 373971fb-e22e-4e9c-aa3f-4cb0c1907416

Veeco GmbH

Vergeben am: 11.05.2026

BKS award notice 373971fb-e22e-4e9c-aa3f-4cb0c1907416

Vergabekammern des Bundes

Vergeben am: 11.05.2026

BKS award notice 373971fb-e22e-4e9c-aa3f-4cb0c1907416